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General Information
    • ISSN: 1793-8236 (Online)
    • Abbreviated Title Int. J. Eng. Technol.
    • Frequency:  Quarterly 
    • DOI: 10.7763/IJET
    • APC: 500 USD
    • Managing Editor: Ms. Isa Yuan 
    • Abstracting/ Indexing:  CNKI,  Google Scholar, Crossref, EBSCO  etc.
    • E-mail: ijet_Editor@126.com
IJET 2012 Vol.4(4): 379-381
doi: 10.7763/IJET.2012.V4.389

The Characteristics of Photo alignment Layer with Chalcone Derivative for 3D Film Applications

Ju Hui Kang , Si Yeol Yang , Seung Yong Jeong , Sangkug Lee , Kyung Ho Choi , Gyo jic Shin

  • the IT Convergence material R&D Group, Korea Institute of Industrial Technology (KITECH), 35-3, Hongcheon-ri, Ipjang-myeon, Seobuk-gu, Cheonan 331-825, South Korea

Abstract

We synthesized photo cross linkable side chain photopolymer with a chalcone derivative in the side chain. The photopolymer has the alkyl spacer introduced between the main chain and chalconyl moiety. The thermal stability of this photopolymer was measured by differential scanning calorimetry and the thermogravimetric analysis measurement. The retardation of prepared photoalignment film with different polarized UV exposure energy was evaluated for confirming λ/4 = 125 nm at 500 nm. This result indicated the photodimerization contributes to the enhancement of LC photoa lignment.

Keywords

  • Chalcone
  • liquid crystals
  • thermal stability
  • photodimerization
  • UV exposure energy
389-E0031

How to Cite

Copied

Ju Hui Kang, Si Yeol Yang, Seung Yong Jeong, Sangkug Lee, Kyung Ho Choi, and Gyo jic Shin, "The Characteristics of Photo alignment Layer with Chalcone Derivative for 3D Film Applications," International Journal of Engineering and Technology, vol. 4, no. 4, pp. 379-381, 2012. https://doi.org/ 10.7763/IJET.2012.V4.389

Copyright & License

Copyright © 2012 by the authors. This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

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