Abstract—Advanced process control (APC) has been
recognized as a proper tool for maximizing profitability of
semiconductor manufacturing facilities by improving efficiency
and product quality. Run-to-run (RtR) process control with
good quality and reliable performance for APC applications are
most applicable. This paper proposes a new RtR control
scheme, tool based disturbance estimator (TBDE) control
scheme, which is adaptive to the mixed product overlay
processes. The TBDE control scheme which employs threaded
double exponential weighted moving average (d-EWMA) with
the drift compensation scheme to deal with the disturbance
caused by tool-induced drift and product-induced shift. The
method is applied to the estimation of overlay parameters in
mixed product lithography overlay process. The experimental
results revealed that application of the TBDE is proven to
significantly improvement in the mixed product overlay
process.
Index Terms—Advanced process control, run-to-run, overlay,
mixed product, TBDE control scheme.
The authors are with the Dept. of Mechanical Engineering, National
Chiao Tung University, Taiwan (e-mail: aclee@mail.nctu.edu.tw,
ypk.me94g@nctu.edu.tw, crazypalsan@hotmail.com).
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Cite:An-Chen Lee, Tzu-Wei Kuo, and Shang-Wei Chiang, "Run-to-Run Mixed Product Overlay Process Control:
Using Tool Based Disturbance Estimator (TBDE)
Approach," International Journal of Engineering and Technology vol. 5, no. 3, pp. 349-351, 2013.
